Lithographic patterning of fluorescent molecules
Jacob Hoogenboom - Former member|
Supramolecular host-guest systems with multivalent interactions between the host and the guest moiety are attractive systems for patterning because of (i) the reversibility of patterning, (ii) the specificity of the host-guest interactions, (iii) the controllable surface affinity, and (iv) the tunability of the host-guest interaction strength. The use of glass substrates covered with a monolayer of cyclodextrin host molecules allows for the patterning and subsequent imaging of fluorescent guest molecules. Fluorescent patterns with a size below the diffraction-limit were written using dip-pen lithography and subsequently imaged using friction-force atomic force microscopy (right image) and fluorescence confocal microscopy with single-molecular sensitivity (left image). Patterns are stable towards rinsing with water and can be erased by rinsing with a cyclodextrin solution.
The following articles have been published regarding this project:
Molecular Printboards on Silicon Oxide: Lithographic Patterning of Cyclodextrin Monolayers with Multivalent, Fluorescent Guest Molecules(abstract) (external link to pdf)
Alart Mulder, Steffen Onclin, Mária Péter, Jacob P. Hoogenboom, Hans Beijleveld, Jurjen ter Maat, María F. García-Parajó, Bart Jan Ravoo, Jurriaan Huskens, Niek F. van Hulst and David N. Reinhoudt
vol 1 no 2 p242-p253 2005